Today, we will introduce magnetron cathodes suitable for the ultra-high vacuum field.
This type of magnetron cathode is manufactured by the German company TFG. The company was founded in 1993 in Grafenberg, Germany
TFG Company has been designing magnetron sputtering cathodes since 1995 and has 20 years of experience in magnetron sputtering cathode design. Its products are mainly used in industrial and research fields.
TFG's magnetron sputtering cathode products have been widely used in China's ultra-high vacuum field and have received many praises.
According to incomplete statistics, over a hundred ultra-high vacuum magnetron cathodes have been put into use in China's production and research fields.
Next, we will take you to a deeper understanding of the unique advantages and size specifications of this product
1. Use all metal seal without rubber parts.
2. Magnets can withstand temperatures of up to 200 ℃ during baking.
3. The background vacuum can be drawn to below 1 * 10-7Pa.
4. Optional angle adjustment, target base distance adjustment, pneumatic baffle and other accessories.
5. Support online adjustment of target substrate distance and sputtering angle.
6. It can work normally under a pressure of 6 * 10-2Pa.
Circular magnetron cathode: suitable for target materials ranging from 1 inch to 12 inches.
Ultra high vacuum circular cathode: suitable for target materials ranging from 1 inch to 8 inches.
